---
title: "Mass Flow Controller (MFC)"
industry: "Chemical Manufacturing"
verification_protocol:
  urn: "URN:CNFX:ME:MASS_FLOW_CONTROLLER_MFC"
  data_integrity_hash: "37355286e636858fdb3d191cb4938c2d"
  source_authority: "https://cnfx.com"
  strict_mode: true
source_identity:
  provider: "CNFX Industrial Knowledge Graph"
  index_version: "2026.Q1-Universal"
  authority_id: "URN:CNFX:ME:MASS_FLOW_CONTROLLER_MFC"
  data_source_uri: "https://cnfx.com/llms/industry/chemical-manufacturing/product/mass-flow-controller-mfc.md"
  official_resource_url: "https://cnfx.com/industry/chemical-manufacturing/product/mass-flow-controller-mfc"
  is_verified_logic: true
attributes:
  spec:
    status: "config-dependent"
    typical_range: "0.5-5000 sccm (standard cubic centimeters per minute) at 0-100 psig inlet pressure, 0-5 VDC or 4-20 mA control signal"
    unit: "sccm"
engineering_limits:
  max_safe_operating_point:
    value: 25
    unit: "°C"
    consequence: "Thermal sensor drift due to Seebeck coefficient variation exceeding 50 μV/K in thermal mass flow sensors, or laminar flow element clogging when particle contamination exceeds 0.3 μm at density &gt;1000 particles/cm³"
fmea_matrix_quantitative:
  - node_1:
      trigger: "Corrosive gas exposure (e.g. HCl at &gt;10 ppm concentration) reacting with 316L stainless steel wetted surfaces"
      severity: 8
      occurrence: 3
      detection: 4
      mitigation_protocol: "Hastelloy C-276 wetted path construction with electropolished surfaces (Ra &lt;0.4 μm) and moisture purge system"
  - node_2:
      trigger: "Particulate contamination (ISO 14644-1 Class 6 environment) accumulating in laminar flow element"
      severity: 8
      occurrence: 3
      detection: 4
      mitigation_protocol: "Dual-stage 0.1 μm absolute filtration with differential pressure monitoring and automatic backflush at ΔP &gt;0.1 bar"
bom_nodes:
  flow-sensor:
    type: "part"
    urn: "URN:CNFX:ME:FLOW_SENSOR"
    interface_type: "physical-logic-coupled"
  control-valve:
    type: "part"
    urn: "URN:CNFX:ME:CONTROL_VALVE"
    interface_type: "physical-logic-coupled"
  electronics-unit:
    type: "part"
    urn: "URN:CNFX:ME:ELECTRONICS_UNIT"
    interface_type: "physical-logic-coupled"
manufacturing_compliance:
  - standard: "ISO 5167-1:2022 MEASUREMENT OF FLUID FLOW BY MEANS OF PRESSURE DIFFERENTIAL DEVICES"
    scope: "Verified Engineering Specification"
  - standard: "ANSI/ISA-75.05.01-2000 CONTROL VALVE SIZING EQUATIONS"
    scope: "Verified Engineering Specification"
  - standard: "DIN EN 60534-2-1:2011 INDUSTRIAL-PROCESS CONTROL VALVES - PART 2-1: FLOW CAPACITY - SIZING EQUATIONS FOR FLUID FLOW UNDER INSTALLED CONDITIONS"
    scope: "Verified Engineering Specification"
url: "https://cnfx.com/llms/industry/chemical-manufacturing/product/mass-flow-controller-mfc.md"
on_chain_sovereignty:
  contract_standard: "ERC-721-Industrial"
  metadata_hash: "b59bf6d89283149e9bfb9d1646f65224bd9c330635cc0974d17567d0bd52603e"
  royalty_logic: "IPFS-CID-REQUIRED"
  mint_status: "logic-verified-ready"
version: "3.3.4-EXTREME-SOVEREIGN-WEB3"
---

# Industrial Specification: Mass Flow Controller (MFC)

## 1. Technical Definition
A precision instrument that measures and controls the flow rate of gases in a system.

## 2. Engineering Reasoning & Causal Matrix
> **Operational Intelligence**: Designed for **0.5-5000 sccm (standard cubic centimeters per minute) at 0-100 psig inlet pressure, 0-5 VDC or 4-20 mA control signal**. Failure boundary: **Flow accuracy degradation beyond ±0.8% of full scale at 25°C, or response time exceeding 2 seconds for 98% step change**, Mechanism: **Thermal sensor drift due to Seebeck coefficient variation exceeding 50 μV/K in thermal mass flow sensors, or laminar flow element clogging when particle contamination exceeds 0.3 μm at density &gt;1000 particles/cm³**.

### 2.1 Analytical Physics Model
Governed by the **Darcy-Weisbach Pressure Drop**:

> **Primary Equation**: $\Delta P = f \cdot \frac{L}{D} \cdot \frac{\rho v^2}{2}$  
> **Engineering Impact**: Critical for sizing CIP (Clean-In-Place) pump heads.

| Symbol | Variable Definition | Localized Reference |
| :--- | :--- | :--- |
| f | Friction Factor | Engineering Constant |
| L | Pipe Length | Engineering Constant |
| v | Velocity | Engineering Constant |

### 2.2 FMEA (Failure Mode & Effects Analysis)
| Event Trigger | Severity | Failure Mode | Mitigation Strategy |
| :--- | :--- | :--- | :--- |
| Corrosive gas exposure (e.g. HCl at &gt;10 ppm concentration) reacting with 316L stainless steel wetted surfaces | 8 | Sensor corrosion leading to zero-point drift exceeding 1% FS/day and flow control error &gt;5% | Hastelloy C-276 wetted path construction with electropolished surfaces (Ra &lt;0.4 μm) and moisture purge system |
| Particulate contamination (ISO 14644-1 Class 6 environment) accumulating in laminar flow element | 8 | Flow restriction causing pressure drop increase &gt;0.15 bar and nonlinear response (R² &lt;0.995) | Dual-stage 0.1 μm absolute filtration with differential pressure monitoring and automatic backflush at ΔP &gt;0.1 bar |

## 3. Key Technical Parameters
| Parameter | Value | Unit | Status |
| :--- | :--- | :--- | :--- |
| spec | Config-dependent | sccm | Verified |

## 4. System BOM & Knowledge Routing
### Core Components (Recursive Links)
- [Flow Sensor](https://cnfx.com/llms/industry/machinery-and-equipment-manufacturing/product/flow-sensor.md) `(Standalone System)`
- [Control Valve](https://cnfx.com/llms/industry/machinery-and-equipment-manufacturing/product/control-valve.md) `(Standalone System)`
- [Electronics Unit](https://cnfx.com/llms/industry/computer-electronic-and-optical-product-manufacturing/product/electronics-unit.md) `(Standalone System)`

### Industrial DNA Context (De-duplicated)
**Complementary Dependencies**: **Gas Supply System**, **Process Control System**, **Gas Purification System**  
**Downstream Applications**: Pharmaceutical Intermediates, Specialty Polymers, Semiconductor Materials  

## 5. Engineering Risks & FAQ
- **Caution**: 
- **Caution**: 
- **Caution**: 

### Q: What makes this mass flow controller suitable for chemical manufacturing applications?
**A**: This MFC is specifically designed for chemical manufacturing with corrosion-resistant stainless steel construction, precise gas flow measurement capabilities, and robust components that withstand harsh chemical environments while maintaining accuracy.

### Q: How does the flow sensor in this MFC ensure accurate gas flow measurement?
**A**: The integrated flow sensor uses advanced thermal or pressure-based technology to continuously monitor gas flow rates, providing real-time data to the electronics unit for precise control and adjustment of the control valve.

### Q: What maintenance is required for this stainless steel mass flow controller?
**A**: Regular calibration checks, cleaning of flow paths to prevent contamination buildup, and inspection of the control valve and electronics connections are recommended to maintain optimal performance in chemical manufacturing processes.

## 6. Manufacturing Compliance
- ISO 5167-1:2022 MEASUREMENT OF FLUID FLOW BY MEANS OF PRESSURE DIFFERENTIAL DEVICES
- ANSI/ISA-75.05.01-2000 CONTROL VALVE SIZING EQUATIONS
- DIN EN 60534-2-1:2011 INDUSTRIAL-PROCESS CONTROL VALVES - PART 2-1: FLOW CAPACITY - SIZING EQUATIONS FOR FLUID FLOW UNDER INSTALLED CONDITIONS

---
### 🛠️ Engineering Resource Access
🔗 **[Full Specification: Mass Flow Controller (MFC)](https://cnfx.com/industry/chemical-manufacturing/product/mass-flow-controller-mfc)**

### 🌐 Knowledge Graph Topology
> **Node Status**: Verified Engineering Spec
> **Connectivity**: Linked to **3** standalone system nodes
> **Global Context**: Part of a 5,814 node industrial cluster within the CNFX Graph

> **Reference ID**: MASS_FLOW_CONTROLLER_MFC | **Authority**: CNFX-2026-ST-001 | **Fingerprint**: a74ebf75
