---
title: "High-Purity Copper Cathode"
industry: "Non-Ferrous Metal Production"
verification_protocol:
  urn: "URN:CNFX:ME:HIGH_PURITY_COPPER_CATHODE"
  data_integrity_hash: "5453d0cc6d36fb7544689d86d4f7299e"
  source_authority: "https://cnfx.com"
  strict_mode: true
source_identity:
  provider: "CNFX Industrial Knowledge Graph"
  index_version: "2026.Q1-Universal"
  authority_id: "URN:CNFX:ME:HIGH_PURITY_COPPER_CATHODE"
  data_source_uri: "https://cnfx.com/llms/industry/non-ferrous-metal-production/product/high-purity-copper-cathode.md"
  official_resource_url: "https://cnfx.com/industry/non-ferrous-metal-production/product/high-purity-copper-cathode"
  is_verified_logic: true
attributes:
  copper_purity:
    status: "config-dependent"
    typical_range: "99.99-99.999% Cu purity, 0.5-1.5 mm thickness, 0.5-2.0 m² surface area"
    unit: "%"
  electrical_resistivity:
    status: "config-dependent"
    typical_range: "99.99-99.999% Cu purity, 0.5-1.5 mm thickness, 0.5-2.0 m² surface area"
    unit: "Ω·m"
engineering_limits:
  max_safe_operating_point:
    value: 0.3
    unit: "mm"
    consequence: "Electrochemical dissolution potential shift at 0.337 V vs SHE, grain boundary oxidation at &gt;150°C in air"
fmea_matrix_quantitative:
  - node_1:
      trigger: "Electrolyte chloride contamination &gt;20 ppm during electrowinning"
      severity: 8
      occurrence: 3
      detection: 4
      mitigation_protocol: "Anion exchange membrane separation with &lt;5 ppm chloride retention"
  - node_2:
      trigger: "Residual sulfur &gt;15 ppm from anode slimes carryover"
      severity: 8
      occurrence: 3
      detection: 4
      mitigation_protocol: "Controlled potential electrolysis at 0.25 V vs Cu/Cu²⁺ reference electrode"
bom_nodes:
  copper-matrix:
    type: "component"
    urn: "URN:CNFX:ME:COPPER_MATRIX"
    interface_type: "physical-logic-coupled"
  surface-oxide-layer:
    type: "component"
    urn: "URN:CNFX:ME:SURFACE_OXIDE_LAYER"
    interface_type: "physical-logic-coupled"
  trace-elements:
    type: "component"
    urn: "URN:CNFX:ME:TRACE_ELEMENTS"
    interface_type: "physical-logic-coupled"
manufacturing_compliance:
  - standard: "ISO 431:1981: COPPER CATHODES - CLASSIFICATION AND DESIGNATION"
    scope: "Verified Engineering Specification"
  - standard: "EN 1978:1998: COPPER AND COPPER ALLOYS - COPPER CATHODES"
    scope: "Verified Engineering Specification"
url: "https://cnfx.com/llms/industry/non-ferrous-metal-production/product/high-purity-copper-cathode.md"
on_chain_sovereignty:
  contract_standard: "ERC-721-Industrial"
  metadata_hash: "37dbe7712dd51f69860f5dce6987bd1a2bb710852a8112220a56c9fbf331b62a"
  royalty_logic: "IPFS-CID-REQUIRED"
  mint_status: "logic-verified-ready"
version: "3.3.4-EXTREME-SOVEREIGN-WEB3"
---

# Industrial Specification: High-Purity Copper Cathode

## 1. Technical Definition
Electrolytically refined copper sheet used as raw material for further processing

## 2. Engineering Reasoning & Causal Matrix
> **Operational Intelligence**: Designed for **99.99-99.999% Cu purity, 0.5-1.5 mm thickness, 0.5-2.0 m² surface area**. Failure boundary: **Cu purity &lt;99.95%, thickness &lt;0.3 mm, surface contamination &gt;50 ppm oxygen equivalent**, Mechanism: **Electrochemical dissolution potential shift at 0.337 V vs SHE, grain boundary oxidation at &gt;150°C in air**.

### 2.2 FMEA (Failure Mode & Effects Analysis)
| Event Trigger | Severity | Failure Mode | Mitigation Strategy |
| :--- | :--- | :--- | :--- |
| Electrolyte chloride contamination &gt;20 ppm during electrowinning | 8 | Intergranular corrosion propagation at 0.1 mm/year in sulfuric acid solutions | Anion exchange membrane separation with &lt;5 ppm chloride retention |
| Residual sulfur &gt;15 ppm from anode slimes carryover | 8 | Hot shortness cracking at 800°C during subsequent rolling operations | Controlled potential electrolysis at 0.25 V vs Cu/Cu²⁺ reference electrode |

## 3. Key Technical Parameters
| Parameter | Value | Unit | Status |
| :--- | :--- | :--- | :--- |
| copper_purity | Config-dependent | % | Verified |
| electrical_resistivity | Config-dependent | Ω·m | Verified |

## 4. System BOM & Knowledge Routing
### Core Components (Recursive Links)

### Industrial DNA Context (De-duplicated)
**Complementary Dependencies**: **Electrolytic Refining Cell**, **Casting Machine**, **Electrolyte Purification System**  
**Downstream Applications**: Copper Wire Rod, Copper Tubes, Copper Alloy Sheets  

## 5. Engineering Risks & FAQ
- **Caution**: 
- **Caution**: 
- **Caution**: 

### Q: What is the typical copper purity percentage for high-purity copper cathodes?
**A**: High-purity copper cathodes typically have a minimum copper purity of 99.99% (4N purity), with some premium grades reaching 99.999% (5N purity) for specialized applications.

### Q: How does the electrical conductivity of copper cathodes affect downstream manufacturing?
**A**: High electrical conductivity (typically 100-101% IACS) ensures efficient energy transmission in wire, cable, and electrical component production, reducing energy losses and improving product performance.

### Q: What industries commonly use high-purity copper cathodes as raw material?
**A**: Primary users include electrical wire and cable manufacturers, electronics component producers, automotive electrical systems, construction materials, and industrial machinery manufacturers requiring high-conductivity copper.

## 6. Manufacturing Compliance
- ISO 431:1981: COPPER CATHODES - CLASSIFICATION AND DESIGNATION
- EN 1978:1998: COPPER AND COPPER ALLOYS - COPPER CATHODES

---
### 🛠️ Engineering Resource Access
🔗 **[Full Specification: High-Purity Copper Cathode](https://cnfx.com/industry/non-ferrous-metal-production/product/high-purity-copper-cathode)**

### 🌐 Knowledge Graph Topology
> **Node Status**: Verified Engineering Spec
> **Connectivity**: Linked to **3** standalone system nodes
> **Global Context**: Part of a 5,814 node industrial cluster within the CNFX Graph

> **Reference ID**: HIGH_PURITY_COPPER_CATHODE | **Authority**: CNFX-2026-ST-001 | **Fingerprint**: 7c74e7f2
