High-purity silicon crystal used as the foundational substrate for semiconductor wafer production in electronics manufacturing.
| Parameter | Typical range | Notes & selection driver |
|---|---|---|
| TTV | <10 μm | |
| Bow/Warp | <50 μm | |
| Diameter | 150mm, 200mm, 300mm | |
| Orientation | <100>, <111> | |
| Resistivity | 1-100 Ω·cm | |
| Surface Roughness | <0.5 nm Ra | |
| Dislocation Density | <1000/cm² | |
| Carbon Concentration | <0.1 ppma | |
| Oxygen Concentration | 5-20 ppma |
Ranges are indicative industry figures for RFQ preparation, not a supplier commitment. Confirm every value and standard with the legal manufacturer before ordering.
This component is used in the following industrial products
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Manufacturer profiles associated with Silicon Crystal.
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Silicon crystal refers to the bulk monocrystalline ingot grown from molten silicon, while silicon wafers are thin slices cut from this crystal and polished for semiconductor processing.
Crystal orientation (<100>, <111>, etc.) determines the electronic properties, etching characteristics, and mechanical strength of the wafer, affecting device performance and manufacturing yield.
Electronic Grade Silicon requires purity of 99.9999999% (9N) or higher, with specific impurity controls for elements like oxygen, carbon, and metallic contaminants.
Editorial classification, named public sources where available, and source-reviewed manufacturer records. See the editorial policy.