Direct Copper Bonded substrate for high-power semiconductor modules providing electrical insulation and thermal management
| Parameter | Typical range | Notes & selection driver |
|---|---|---|
| CTE Mismatch | 5.5-7.5 ppm/K (matched to silicon) | |
| Peel Strength | >8 N/mm | |
| Copper Thickness | 0.1-0.6 mm | |
| Ceramic Thickness | 0.25-1.0 mm | |
| Surface Roughness | Ra < 0.5 μm | |
| Dielectric Strength | >10 kV/mm | |
| Thermal Conductivity | 24-180 W/mK (depending on ceramic) |
Ranges are indicative industry figures for RFQ preparation, not a supplier commitment. Confirm every value and standard with the legal manufacturer before ordering.
This component is used in the following industrial products
A practical evidence checklist for RFQ preparation and supplier evaluation.
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Manufacturer profiles associated with DCB Substrate.
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DCB substrates provide significantly better thermal conductivity (10-20x higher) and higher dielectric strength, allowing them to handle much higher power densities and voltages while maintaining reliable electrical isolation under extreme thermal cycling conditions.
Choose Aluminum Nitride (AlN) when thermal conductivity above 150 W/mK is required for high-power density applications or when coefficient of thermal expansion matching to silicon is critical. Choose Aluminum Oxide (Al2O3) for cost-sensitive applications where thermal requirements are moderate (24-30 W/mK).
Primary failure modes include: 1) Delamination at copper-ceramic interface due to thermal cycling stress, 2) Cracking of ceramic layer from mechanical stress or thermal shock, 3) Copper oxidation leading to increased thermal resistance, and 4) Dielectric breakdown under overvoltage conditions.
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