Substrate/Disc Body is the foundational component in anode disc/target assemblies for physical vapor deposition (PVD) systems, providing structural support and thermal management.
| Parameter | Typical range | Notes & selection driver |
|---|---|---|
| Diameter | 100-500 mm | |
| Flatness | <0.05 mm | |
| Thickness | 10-50 mm | |
| Surface Roughness | Ra < 0.8 μm | |
| Thermal Conductivity | >200 W/m·K | |
| Water Cooling Channels | Standard (for high-power applications) | |
| Maximum Operating Temperature | 300°C |
Ranges are indicative industry figures for RFQ preparation, not a supplier commitment. Confirm every value and standard with the legal manufacturer before ordering.
This component is used in the following industrial products
A practical evidence checklist for RFQ preparation and supplier evaluation.
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Manufacturer profiles associated with Substrate/Disc Body.
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It provides structural support for the sputtering target material and efficiently dissipates heat generated during the PVD process to prevent target degradation.
Copper offers excellent thermal conductivity (>400 W/m·K) and good machinability, making it ideal for heat dissipation in high-power sputtering applications.
Proper thermal management through the Substrate/Disc Body ensures consistent target erosion rates, leading to uniform film thickness and improved coating adhesion.
Editorial classification, named public sources where available, and source-reviewed manufacturer records. See the editorial policy.