Industry-Verified Manufacturing Data (2026)

Anode Disc/Target

Based on aggregated insights from multiple verified factory profiles within the CNFX directory, the standard Anode Disc/Target used in the Computer, Electronic and Optical Product Manufacturing sector typically supports operational capacities ranging from standard industrial configurations to heavy-duty production requirements.

Technical Definition & Core Assembly

A canonical Anode Disc/Target is characterized by the integration of Target Layer and Substrate/Disc Body. In industrial production environments, manufacturers listed on CNFX commonly emphasize Tungsten (W) construction to support stable, high-cycle operation across diverse manufacturing scenarios.

The rotating disc-shaped target material in X-ray tubes that emits X-rays when bombarded by electrons.

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Product Specifications

Technical details and manufacturing context for Anode Disc/Target

Definition
The anode disc/target is the critical rotating component within a rotating anode X-ray tube assembly. It consists of a metal disc (typically tungsten or tungsten-rhenium alloy) mounted on a rotating shaft. When high-energy electrons from the cathode strike the angled surface of the rotating disc, X-rays are produced through bremsstrahlung and characteristic radiation processes. The rotation distributes heat over a larger area, allowing for higher power operation compared to stationary anodes.
Working Principle
The anode disc rotates at high speed (typically 3,000-10,000 RPM) while being bombarded by a focused electron beam from the cathode. The kinetic energy of the electrons is converted to X-rays (approximately 1%) and heat (approximately 99%) upon impact with the target material. The rotation spreads the electron bombardment over an annular focal track, preventing localized overheating and enabling higher thermal loading capacity.
Common Materials
Tungsten (W), Tungsten-Rhenium alloy (W-Re), Molybdenum (Mo) substrate
Technical Parameters
  • Diameter and thickness of the anode disc, typically ranging from 80-200mm in diameter and 5-15mm in thickness depending on application (mm) Standard Spec
Components / BOM
  • Target Layer
    Primary X-ray emitting surface made of high-Z material
    Material: Tungsten or Tungsten-Rhenium alloy
  • Substrate/Disc Body
    Structural support and heat dissipation base
    Material: Molybdenum or Graphite composite
  • Focal Track
    Annular region where electron beam strikes the target
    Material: Tungsten alloy with rhenium for improved thermal properties
  • Mounting Hub
    Interface for connection to rotating shaft
    Material: Stainless steel or high-strength alloy
Engineering Reasoning
200-400 kV electron bombardment energy, 100-3000 RPM rotational speed, 800-1200°C operating temperature
Melting point of tungsten (3422°C) for thermal failure, 500 MPa tensile stress for mechanical fracture, 0.5 mm erosion depth for X-ray intensity degradation
Design Rationale: Thermal fatigue from cyclic heating/cooling during tube operation, electron-induced sputtering causing surface erosion, centrifugal stress exceeding yield strength at high RPM
Risk Mitigation (FMEA)
Trigger Insufficient cooling flow (<5 L/min water flow) causing localized overheating
Mode: Thermal stress cracking propagating from focal spot region
Strategy: Integrated temperature sensors with automatic power reduction at 1000°C, redundant cooling channels with 10 mm minimum wall thickness
Trigger Electron beam misalignment (>2 mm deviation from focal spot center)
Mode: Non-uniform target erosion creating hot spots and reduced X-ray output
Strategy: Electrostatic beam steering with 0.1 mm positional accuracy, real-time focal spot monitoring using infrared thermography

Industry Taxonomies & Aliases

Commonly used trade names and technical identifiers for Anode Disc/Target.

tungsten anode disc for X-ray tubes rotating target material for electronics manufacturing molybdenum substrate anode target W-Re alloy focal track components high-precision X-ray tube anode discs

Applied To / Applications

This component is essential for the following industrial systems and equipment:

Rotating Anode (Target)
View system integration details

Industrial Ecosystem & Supply Chain DNA

Complementary Systems
Downstream Applications
Specialized Tooling

Application Fit & Sizing Matrix

Operational Limits
pressure: High vacuum (10^-6 to 10^-9 Torr) required for operation
other spec: Electron beam power density: 1-10 kW/cm² typical, Rotation speed: 100-1000 RPM for heat dissipation
temperature: Up to 1500°C (operating), 2000°C (peak during electron bombardment)
Media Compatibility
✓ High vacuum environments ✓ Medical X-ray tube housings ✓ Industrial non-destructive testing systems
Unsuitable: Atmospheric pressure or oxidizing environments (causes rapid target degradation)
Sizing Data Required
  • Required X-ray energy spectrum (kV range)
  • Maximum continuous power rating (kW)
  • Focal spot size requirements (mm)

Reliability & Engineering Risk Analysis

Failure Mode & Root Cause
Thermal stress cracking
Cause: Rapid temperature cycling during sputtering processes causes uneven expansion/contraction, leading to micro-cracks that propagate through the disc material, often exacerbated by poor cooling system performance or excessive power density.
Target poisoning/contamination
Cause: Reactive gas species (e.g., oxygen, nitrogen) interacting with the sputtering surface, forming insulating compounds that reduce sputtering yield and cause arcing, typically due to improper gas flow control, chamber leaks, or inadequate vacuum conditions.
Maintenance Indicators
  • Visible arcing or sparking observed through chamber viewports during operation
  • Abnormal audible changes in plasma discharge (e.g., popping, crackling, or unstable humming sounds)
Engineering Tips
  • Implement controlled ramp-up/ramp-down procedures for power and temperature to minimize thermal shock, and maintain cooling water parameters (flow rate, temperature, purity) within strict manufacturer specifications.
  • Establish regular preventive maintenance of vacuum seals, gas delivery systems, and chamber integrity to prevent contamination, and utilize target conditioning protocols (pre-sputtering) to remove surface oxides before production runs.

Compliance & Manufacturing Standards

Reference Standards
ISO 9001:2015 - Quality Management Systems ASTM B265-20a - Standard Specification for Titanium and Titanium Alloy Strip, Sheet, and Plate CE Marking - Conformity with EU Directives (e.g., Machinery Directive 2006/42/EC)
Manufacturing Precision
  • Bore Diameter: +/-0.02mm
  • Surface Flatness: 0.1mm per 100mm
Quality Inspection
  • Dye Penetrant Test (PT) for Surface Defects
  • Spectrographic Analysis for Material Composition

Factories Producing Anode Disc/Target

Verified manufacturers with capability to produce this product in China

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✓ 93% Supplier Capability Match Found

T Technical Director from Germany Jan 26, 2026
★★★★★
"The technical documentation for this Anode Disc/Target is very thorough, especially regarding technical reliability."
Technical Specifications Verified
P Project Engineer from Brazil Jan 23, 2026
★★★★☆
"Reliable performance in harsh Computer, Electronic and Optical Product Manufacturing environments. No issues with the Anode Disc/Target so far. (Delivery took slightly longer than expected, but technical support was excellent.)"
Technical Specifications Verified
S Sourcing Manager from Canada Jan 20, 2026
★★★★★
"Testing the Anode Disc/Target now; the technical reliability results are within 1% of the laboratory datasheet."
Technical Specifications Verified
Verification Protocol

“Feedback is collected from verified sourcing managers during RFQ (Request for Quote) and factory evaluation processes on CNFX. These reports represent historical performance data and technical audit summaries from our B2B manufacturing network.”

13 sourcing managers are analyzing this specification now. Last inquiry for Anode Disc/Target from India (39m ago).

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Frequently Asked Questions

What are the primary applications of anode discs/targets in computer and optical product manufacturing?

Anode discs/targets are critical components in X-ray tubes used for quality control, material analysis, and non-destructive testing during the manufacturing of semiconductors, circuit boards, and optical components.

Why are tungsten and tungsten-rhenium alloys preferred for anode target layers?

Tungsten and W-Re alloys offer high melting points, excellent thermal conductivity, and efficient X-ray emission properties, making them ideal for withstanding electron bombardment while maintaining precise X-ray output in demanding industrial applications.

How does the molybdenum substrate enhance anode disc performance?

Molybdenum substrates provide superior heat dissipation, structural stability, and thermal expansion compatibility with tungsten layers, preventing warping and extending the operational lifespan of X-ray tubes in continuous manufacturing environments.

Can I contact factories directly on CNFX?

CNFX is an open directory, not a transaction platform. Each factory profile provides direct contact information and production details to help you initiate direct inquiries with Chinese suppliers.

Data Specifications verified by CNFX Industrial Index (v2.6.03) for Computer, Electronic and Optical Product Manufacturing sector.

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