This page explains how Pattern Generation Element is classified within Computer, Electronic and Optical Product Manufacturing. Technical values and manufacturer relationships are research references; confirm the current specification and supplier evidence for each order.
A Pattern Generation Element is a critical optical component used in structured light projectors to generate precise light patterns, such as grids, dots, or lines, for applications including 3D scanning, measurement, and surface analysis.
Technical details and manufacturing context for Pattern Generation Element
| Parameter | Typical range | Notes & selection driver |
|---|---|---|
| Wavelength Range | 400–700 nm | Visible spectrum; other ranges on request |
| Pattern Resolution | 100–500 lp/mm | Higher resolution for finer patterns |
| Diffraction Efficiency | 80–95 % | Higher efficiency reduces light loss |
| Substrate Material | Fused Silica | Low thermal expansion, high transmission |
| Surface Flatness | λ/10 | Ensures pattern accuracyISO 10110 |
| Surface Quality | 20-10 scratch-dig | Higher grade reduces scatterISO 10110 |
| Operating Temperature | -40–85 °C | Outside range may cause deformation |
| Humidity Range | 5–95 % RH | Non-condensing |
| Laser Damage Threshold | 5–10 J/cm² | For 1064 nm, 10 ns pulseISO 11254 |
| Substrate Diameter | 10–100 mm | Custom sizes available |
| Thickness | 1–5 mm | Affects mechanical stability |
| Weight | 0.5–50 g | Depends on size and thickness |
Ranges are indicative industry figures for RFQ preparation, not a supplier commitment. Confirm every value and standard with the legal manufacturer before ordering.
| pressure: | 0 to 1 atm (non-pressurized) |
| other spec: | Wavelength range: 400-700 nm, Pattern accuracy: ±0.1% |
| temperature: | -40°C to +85°C |
Indicative industry ranges for design and RFQ preparation. Confirm the exact figures and applicable standard with the manufacturer before specifying.
Quoted from the published standard.
A practical evidence checklist for RFQ preparation and supplier evaluation.
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Manufacturer profiles associated with Pattern Generation Element.
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It is used in structured light projectors to generate precise light patterns (grids, dots, lines) for 3D scanning, measurement, and surface analysis.
Fused silica, optical glass, and polymer substrates are listed as options. The specific material affects performance and durability.
Wavelength range, pattern resolution, diffraction efficiency, surface flatness, surface quality, operating temperature, humidity, laser damage threshold, and dimensions. Confirm with the manufacturer for your application.
Operate within specified temperature, humidity, and laser damage thresholds. Avoid contamination and physical damage. Follow manufacturer handling guidelines.
This component is essential for the following industrial systems and equipment:
Editorial classification, named public sources where available, and source-reviewed manufacturer records.
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