Ultra-pure fused silica powder matrix used in high-temperature industrial applications requiring exceptional thermal stability and chemical inertness.
Commonly used trade names and technical identifiers for Silicon Dioxide Matrix.
This component is used in the following industrial products
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The silicon dioxide matrix maintains structural integrity up to 1200°C continuously, with short-term exposure capability up to 1400°C. The softening point exceeds 1650°C.
Controlled particle size distribution (45-65 μm D50) ensures optimal packing density, flow characteristics, and sintering behavior. Finer particles improve surface area for reactions, while coarser particles enhance flowability in powder handling systems.
Primary applications include semiconductor manufacturing (wafer carriers, diffusion tubes), optical components (lenses, prisms), high-temperature furnace linings, investment casting molds, and laboratory equipment requiring chemical inertness.
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