Industry-Verified Manufacturing Data (2026)

Micro-lens Array

Based on aggregated insights from multiple verified factory profiles within the CNFX directory, the standard Micro-lens Array used in the Computer, Electronic and Optical Product Manufacturing sector typically supports operational capacities ranging from standard industrial configurations to heavy-duty production requirements.

Technical Definition & Core Assembly

A canonical Micro-lens Array is characterized by the integration of Lens Body and Planarization Layer. In industrial production environments, manufacturers listed on CNFX commonly emphasize Polymer (e.g., photosensitive resin) construction to support stable, high-cycle operation across diverse manufacturing scenarios.

An array of microscopic lenses integrated onto the surface of an image sensor pixel array to focus incident light onto the photosensitive area of each pixel.

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Product Specifications

Technical details and manufacturing context for Micro-lens Array

Definition
A micro-lens array is a critical optical component in modern image sensors, consisting of a precisely patterned grid of microscopic polymer or glass lenses. Each microlens corresponds to an individual pixel's photodiode. Its primary function is to collect and concentrate incoming light that would otherwise fall on non-photosensitive areas (like transistor circuitry and metal interconnects) and redirect it onto the active silicon photodiode region. This significantly increases the sensor's quantum efficiency, fill factor, and overall light sensitivity, which is essential for high-performance imaging in low-light conditions and for achieving higher resolution in compact camera modules.
Working Principle
Light incident on the image sensor surface first passes through the color filter array and then strikes the convex surface of each individual microlens in the array. Based on the principles of refraction, each microlens bends and focuses the light rays, concentrating them down through the planarization layer and onto the smaller, active area of the underlying photodiode. This process maximizes the amount of light captured by each pixel, improving the signal-to-noise ratio and the sensor's effective sensitivity.
Common Materials
Polymer (e.g., photosensitive resin), Silicon Dioxide (SiO₂), Silicon Nitride (Si₃N₄)
Technical Parameters
  • Pitch/Lens Diameter; typically matches the pixel pitch of the sensor (e.g., 1.0µm, 1.4µm). (µm) Per Request
Components / BOM
  • Lens Body
    The main convex optical element that refracts and focuses incident light.
    Material: Polymer or Silicon-based dielectric
  • Planarization Layer
    A flat, transparent layer beneath the microlenses that provides a smooth surface for lens formation and protects underlying layers.
    Material: Silicon Dioxide (SiO₂) or polymer
Engineering Reasoning
1.0-100.0 mW/mm² incident light intensity, 400-700 nm wavelength, -40°C to +85°C operating temperature
Lens sag deformation exceeding 50 nm RMS surface deviation, microlens-to-pixel misalignment >0.5 μm, polymer lens material glass transition temperature (Tg) threshold at 120°C
Design Rationale: Thermo-mechanical stress from coefficient of thermal expansion mismatch (CTE silicon: 2.6 ppm/°C vs. polymer lens: 60-80 ppm/°C) causing delamination; UV-induced photodegradation of polymer lens material at wavelengths <400 nm; capillary forces during liquid lens fabrication causing surface tension-induced deformation
Risk Mitigation (FMEA)
Trigger Thermal cycling stress exceeding 1000 cycles between -40°C and +85°C
Mode: Microlens array delamination from silicon substrate with adhesion strength reduction below 10 MPa
Strategy: Graded CTE interlayer stack (SiO₂/SiNₓ) with thickness ratio 100:50 nm; low-stress polymer formulation with Young's modulus <3 GPa
Trigger High-energy photon exposure at 365 nm wavelength with intensity >50 mW/cm² for >1000 hours
Mode: Polymer lens material refractive index change exceeding Δn > 0.01, causing focal length shift >5%
Strategy: UV-blocking inorganic coating (HfO₂/SiO₂ multilayer) with 95% reflectance at 200-400 nm; benzotriazole-based photostabilizer additive at 0.5-1.0 wt% concentration

Industry Taxonomies & Aliases

Commonly used trade names and technical identifiers for Micro-lens Array.

micro-lens array for image sensors polymer micro-lens manufacturing silicon dioxide optical lens arrays photosensitive resin lens technology planarization layer in optical devices

Applied To / Applications

This component is essential for the following industrial systems and equipment:

Image Sensor
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Camera Sensor (CMOS/CCD)
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Image Sensor Array
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Photodetector Array (e.g., CMOS/CCD)
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Industrial Ecosystem & Supply Chain DNA

Complementary Systems
Downstream Applications
Specialized Tooling

Application Fit & Sizing Matrix

Operational Limits
pressure: Atmospheric pressure only (non-pressure rated)
other spec: Wavelength range: 400-1100 nm, Angular acceptance: ±15°
temperature: -40°C to +85°C (operational), -55°C to +125°C (storage)
Media Compatibility
✓ Visible light imaging ✓ Near-infrared sensing ✓ UV-cured optical adhesives
Unsuitable: High-energy particle radiation environments (e.g., nuclear facilities, space radiation belts)
Sizing Data Required
  • Pixel pitch (microns)
  • Required fill factor (%)
  • Target wavelength range (nm)

Reliability & Engineering Risk Analysis

Failure Mode & Root Cause
Lens surface contamination
Cause: Accumulation of dust, oil mist, or particulates from the operating environment, leading to reduced optical clarity and performance degradation.
Mechanical misalignment
Cause: Thermal expansion/contraction, vibration, or improper handling causing displacement of individual lenses, resulting in distorted output patterns.
Maintenance Indicators
  • Visible haze, spots, or discoloration on lens surfaces under inspection lighting
  • Irregular or distorted output patterns during functional testing
Engineering Tips
  • Implement controlled cleanroom environment with positive pressure and HEPA filtration to minimize particulate contamination
  • Use precision mounting fixtures with thermal compensation materials and vibration isolation to maintain optical alignment

Compliance & Manufacturing Standards

Reference Standards
ISO 10110-5:2015 (Optics and photonics - Preparation of drawings for optical elements and systems - Part 5: Surface form tolerances) ANSI/OP 1.001-2009 (American National Standard for Optics and Optical Instruments - Preparation of drawings for optical elements and systems) DIN 3140-7:2016 (Drawing indications for optical elements and systems - Part 7: Surface form tolerances)
Manufacturing Precision
  • Lens pitch: +/- 0.5 μm
  • Surface roughness: Ra ≤ 10 nm
Quality Inspection
  • Interferometric surface profile measurement
  • Optical performance testing (MTF measurement)

Factories Producing Micro-lens Array

Verified manufacturers with capability to produce this product in China

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✓ 97% Supplier Capability Match Found

P Procurement Specialist from Canada Jan 19, 2026
★★★★★
"Found 21+ suppliers for Micro-lens Array on CNFX, but this spec remains the most cost-effective."
Technical Specifications Verified
T Technical Director from United States Jan 16, 2026
★★★★★
"The technical documentation for this Micro-lens Array is very thorough, especially regarding technical reliability."
Technical Specifications Verified
P Project Engineer from United Arab Emirates Jan 13, 2026
★★★★★
"Reliable performance in harsh Computer, Electronic and Optical Product Manufacturing environments. No issues with the Micro-lens Array so far."
Technical Specifications Verified
Verification Protocol

“Feedback is collected from verified sourcing managers during RFQ (Request for Quote) and factory evaluation processes on CNFX. These reports represent historical performance data and technical audit summaries from our B2B manufacturing network.”

9 sourcing managers are analyzing this specification now. Last inquiry for Micro-lens Array from USA (42m ago).

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Frequently Asked Questions

What are the primary applications of micro-lens arrays in electronic manufacturing?

Micro-lens arrays are primarily used in image sensors for cameras, smartphones, and medical imaging devices to improve light sensitivity and image quality by directing more light onto each pixel's photosensitive area.

How do materials like silicon dioxide and photosensitive resin affect micro-lens array performance?

Silicon dioxide provides excellent optical clarity and durability, while photosensitive resins allow for precise, cost-effective patterning through photolithography, enabling high-resolution lens arrays with consistent optical properties.

What is the role of the planarization layer in micro-lens array construction?

The planarization layer creates a smooth, flat surface on the image sensor substrate before lens application, ensuring uniform lens alignment and optimal light focusing performance across the entire array.

Can I contact factories directly on CNFX?

CNFX is an open directory, not a transaction platform. Each factory profile provides direct contact information and production details to help you initiate direct inquiries with Chinese suppliers.

Data Specifications verified by CNFX Industrial Index (v2.6.03) for Computer, Electronic and Optical Product Manufacturing sector.

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