Semiconductor Manufacturing Equipment
View system integration details
Based on aggregated insights from multiple verified factory profiles within the CNFX directory, the standard Plasma Source used in the Computer, Electronic and Optical Product Manufacturing sector typically supports operational capacities ranging from standard industrial configurations to heavy-duty production requirements.
A canonical Plasma Source is characterized by the integration of RF Matching Network and Electrode. In industrial production environments, manufacturers listed on CNFX commonly emphasize Quartz construction to support stable, high-cycle operation across diverse manufacturing scenarios.
A device that generates and controls plasma for semiconductor processing applications
Technical details and manufacturing context for Plasma Source
Commonly used trade names and technical identifiers for Plasma Source.
This component is essential for the following industrial systems and equipment:
| pressure: | 1 mTorr - 10 Torr |
| flow rate: | 10-1000 sccm |
| frequency: | 13.56 MHz or 2.45 GHz |
| power range: | 100-5000 W |
| temperature: | 20-400°C |
Verified manufacturers with capability to produce this product in China
✓ 98% Supplier Capability Match Found
Authentic performance reports from verified B2B procurement managers.
"The Plasma Source we sourced perfectly fits our Computer, Electronic and Optical Product Manufacturing production line requirements."
"Found 59+ suppliers for Plasma Source on CNFX, but this spec remains the most cost-effective."
"The technical documentation for this Plasma Source is very thorough, especially regarding technical reliability."
“Feedback is collected from verified sourcing managers during RFQ (Request for Quote) and factory evaluation processes on CNFX. These reports represent historical performance data and technical audit summaries from our B2B manufacturing network.”
Constructed with quartz, aluminum, stainless steel, and ceramics to withstand high-temperature plasma environments and ensure long-term reliability in semiconductor processing.
The RF matching network optimizes power delivery to the plasma, ensuring consistent ionization and stable processing conditions critical for semiconductor manufacturing precision.
An integrated cooling system maintains optimal operating temperatures, preventing overheating and ensuring consistent plasma performance during extended semiconductor processing cycles.
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