Heated Stage (Chuck)
View system integration details
This page explains how Vacuum Chuck is classified within Machinery and Equipment Manufacturing. Technical values and manufacturer relationships are research references; confirm the current specification and supplier evidence for each order.
A component of a heated stage that uses vacuum pressure to securely hold workpieces in place during manufacturing processes.
Technical details and manufacturing context for Vacuum Chuck
| Parameter | Typical range | Notes & selection driver |
|---|---|---|
| Holding Force | 0.5–2.5 kN | Depends on vacuum level and surface area |
| Vacuum Level | -80–-60 kPa | Relative to atmospheric pressure |
| Operating Pressure | 0.4–0.8 MPa | Supply pressure for vacuum generator |
| Temperature Range | -20–80 °C | Continuous operation |
| Leak Rate | ≤0.1 Pa·m³/s | At rated vacuum |
| Surface Flatness | ±0.02 mm | Over entire chuck surface |
| Surface Roughness | Ra 0.8–1.6 µm | For sealing and workpiece contact |
| Material | Aluminum 6061-T6 | Corrosion resistant, lightweightASTM B221 |
| Weight | 5–20 kg | Depends on size |
| Dimensions | 200×200–600×600 mm | Custom sizes available |
| IP Rating | IP54–IP65 | Dust and water resistanceIEC 60529 |
Ranges are indicative industry figures for RFQ preparation, not a supplier commitment. Confirm every value and standard with the legal manufacturer before ordering.
| pressure: | Up to -0.9 bar vacuum (typical), 1-2 bar positive pressure for purge/cleaning |
| flow rate: | 0.5-5 L/min (vacuum pump capacity dependent) |
| temperature: | -20°C to 200°C (operating range, dependent on seal material) |
| slurry concentration: | Not applicable - vacuum chucks typically avoid slurry contact; use with dry or low-particulate media only |
Indicative industry ranges for design and RFQ preparation. Confirm the exact figures and applicable standard with the manufacturer before specifying.
Quoted from the published standard.
A practical evidence checklist for RFQ preparation and supplier evaluation.
Compare the published product scope and source details, then include your specifications and quantity in an enquiry.
3 companies list this product among what they make. Company figures are quoted from each company's own website; every card states where the relationship came from.
The official Wafer Vacuum Chucks page describes dense sintered silicon carbide chucks with micro-pin support surfaces, machining and polishing, and customisable vacuum channels and mounting interfaces for wafer handling. Provide tool interface and wafer requirements and confirm inspection reports; nanometre positioning or import-replacement claims are not verified performance, and the chuck is not a heated platform.
Explore company information and manufacturing capabilities, then discuss the scope of your project with a relevant supplier.
Ask for use case, specification boundaries, supplier type, and RFQ preparation information for this product.
The holding force is typically 0.5–2.5 kN, depending on the vacuum level and surface area. Confirm the exact value for your specific model with the manufacturer.
Available materials include aluminum alloy, stainless steel, and ceramic. The specific grade, such as Aluminum 6061-T6, is listed as a reference and should be verified.
The chuck is designed for continuous operation in a temperature range of -20 to 80 °C. Ensure your process stays within this range.
Surface flatness is ±0.02 mm over the entire chuck surface, and surface roughness is Ra 0.8–1.6 µm. These values should be confirmed with the manufacturer for your specific unit.
This component is essential for the following industrial systems and equipment:
Commonly used trade names and technical identifiers for Vacuum Chuck.
Editorial classification, named public sources where available, and source-reviewed manufacturer records.
Compare manufacturer profiles with relevant product and process capability.